新闻内容
2009 ULSI vs. TFT
OFWEEK.com  2008-08-14 09:04  来源:光电新闻网  

International Conference on Semiconductor Technology for Ultra Large Scale
Integrated Circuits and Thin Film Transistors
Engineering Conferences International July 5 - 10, 2009, Xian, China

 

The conference will provide a forum to discuss the latest developments in semiconductor technology, ranging from nano science to giga scale integration. It''''s goal is to exchange state-of-the-art information among those involved in research and development of two emerging semiconductor technologies, which are ultra large scale integrated (ULSI) circuits and thin film transistor (TFT) arrays. Both technologies are based on same principles and face common challenges in areas of devices, new materials, low-temperature processes, integration, reliability, and novel applications. This will be the only conference bringing together experts from the two different areas to discuss ideas and exchange opinions on future scientific and engineering challenge in a cohesive way.

 

Technical Program:
ULSI and TFT
■ Devices, Structures, and Reliability
■  Dielectrics and Semiconductors
■ Interconnection Technology
■  Advances Processes and Production Reliability
■  Substrates and Advanced Applications
■  Panel Discussions
Technical Co-sponsors (pending):
Electrochem. Soc. Electronics and Photonics Division, Sematech,
IMEC, IEEE EDS, IET, Japan Soc. Applied Physics, Korean
Physical Society, Taiwan MRS, Chinese National Natural Science
Foundation, IEEE EDS Beijing Chapter, NSF

Conf. Chair: Yue Kuo, Texas A&M U., yuekuo@tamu.edu
Co-Chair: Michael Shur, RPI, shurm@rpi.edu
Dieter Ast, Cornell U., dast@ccmr.cornell.edu
W. I. Milne, Cambridge U., wim1@cam.ac.uk
S. Xiong, Nankai U., xiongsz@nankai.edu.cn
Scientific Advisory Committee (tentative)
G. Bersuker, Sematech M. Hatano, Hitachi
O. Bonnaud, U. de Rennes I R. Huang, Peking U.
I. Boyd, Univ. College London J. Jang, KyungHee U.
D. N. Buckley, U. Limerick P. Kohl, Georgia Inst. Tech.
G. Celler, Soitec T. P. Ma, Yale U.
L. J. Chen, National TsingHua U. A. Nathan, London Center Nanotech.
C. Claeys, IMEC J. Peterson, Albany NanoTech
S. Fonash, Pennsylvania State U. C. Reita, CES
S. Hamaguchi, Osaka U. R. Street, PARC
M. K. Han, Seoul National U. Y. Yamamoto, Sharp

Detailed information will be available after January 2009 at
http:/www.engconfintl.org/

相关新闻
发表评论
看不清,点击换一张
热点新闻
用户登录--OFWeek中国光电门户网站